| 196 | 4 | 120 |
| 下载次数 | 被引频次 | 阅读次数 |
三氯氢硅生产工艺中产生大量尾气,主要成分氢气、氯化氢、氯硅烷,如果直接排放不但污染环境,而且造成资源的浪费。用树脂吸附法对尾气进行回收并再利用,具有较大的工业应用前景。在Ф10×380mm玻璃吸附柱内,用型号为A1、A2、A3的3种大孔树脂,进行了吸附和解吸性能研究。结果表明,A1树脂性能最优。最佳吸附工艺条件为:温度20℃,尾气流量5L/h,吸附时间2.8h。解吸过程的最佳工艺条件:温度110℃,氮气流量7.5L/h,时间1.5h。
Abstract：A large amount of exhaust gas,primarily composed of hydrogen,hydrogen chloride and chlorosilanes,are produced during the production of trichlorosilane.Direct discharging of these components not only pollutes the environment but also wastes the precious resources.Recovery and reuse chlorosilane and HCl by adsorption are of great prospect for industrial applications.The optimal conditions for the recovery of HCl and chlorosilanes were determined in a Φ10×380mm column packed with resin A1.Among the three macroporous adsorption resins(A1,A2 and A3),A1 was found to be the best for adsorbing chlorosilane and HCl through a series of dynamic adsorption experiments.The best conditions for adsorption were: temperature 20℃,gas flow rate 5L/h,adsorption time 2.8h;and the best conditions for desorption were: temperature 110℃,nitrogen flow rate 7.5L/h,time 1.5h.
[1]黄同林.氯碱工业[J].2010,46(20):28-30.
[2]Inaba I,Takeguchi M.Apparatus for Manufacture of Trichlorosilane from Silicon Powder and Hydrochloric Acid Gas[P].Jpn Kokai Tokkyo Koho:JP2010184846.
[3]Moon Y H,Lee D G,Oh S W,et al.Method an Apparatus for Preparing SiHCl 3 Using Catalyst and Reaction Heat[P].Repub Korean Kongkae Taeho Kongbo:KR2010091573.
[4]Bill J M J,Merkh C W.Process for Producing Trichlorosilane[P].US Pat Appl Publ:US 2009060819.
[5]Shimizu T,Oguro K.Method for Producing Trichlorosilane[P].US Pat Appl Publ:US 2009060817.
[6]谷文军,孟祥考,吴军祥.氯碱工业[J].2009,45(10):35-36.
[7]王小辉,何佳华.中国氯碱[J].2007,(6):39-40.
[8]钱庭宝,刘维琳.离子交换树脂应用手册[M].天津:南开大学出版社,1989.
[9]王方,凌达仁,黄文强.国际通用离子交换技术手册[M].北京:科学技术文献出版社,2000.
基本信息:
DOI：10.16026/j.cnki.iea.2011.06.009
中图分类号:TQ127.2
引用信息:
[1]宋宝东,庞春霞,宋宜华,等.大孔树脂吸附法回收三氯氢硅生产过程中的尾气[J].离子交换与吸附,2011,27(06):562-569.DOI:10.16026/j.cnki.iea.2011.06.009.
2011-12-20
2011-12-20